Semiconductor
8 inch Vertical Wafer
Semiconductor Furnace Business
8 inch Vertical Wafer
General Spec
- Wafer Size 200mm
- Production Wafer 100(Dual Boat)
- Process Application N2 Anneal
- System Dimension Customizable Option
- Wafer Loading Full Automation
- Wafer Mapping Sensor Installed
- Heater Control Zone 5 Zone
- Temp Flat Zone 860mm
- Main Control PLC + PC control
- Wafer robot type Vaccum chuck(5)
- MES, FDC control Yes
Hardware Performance
- Temp accuracy Set/Actual : ≤0.5°C
- Gas flow control Set/Actual : ≤1.0°C
- Wafer breakage 0.01%
- Safety Safety interlock, Mapping Sensor, leak detector
Process Performance
- Particle < 20ea (0.16um)
- Throughput 200 wafer/hour
Customer
- Partner SK SILTRON